Magnetoresistance studies and optimization of deposition parameters of pulsed electron deposited La0.6Pb0.4Mn0.8Ru0.2O3 thin films
Eur. Phys. J. Appl. Phys., 55 2 (2011) 20301
Published online: 2011-08-11
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https://doi.org/10.1063/1.4774238