Dry plasma processing for industrial crystalline silicon solar cell production
Eur. Phys. J. Appl. Phys., 52 1 (2010) 11101
Published online: 2010-09-22
Articles citing this article
The Citing articles tool gives a list of articles citing the current article.
The citing articles come from EDP Sciences database, as well as other publishers participating in CrossRef Cited-by Linking Program. You can set up your personal account to receive an email alert each time this article is cited by a new article (see the menu on the right-hand side of the abstract page).
Cited article:
This article has been cited by the following article(s):
Plasma‐Based Technologies for Halide Perovskite Photovoltaics
Vincenza Armenise, Sara Covella, Francesco Fracassi, Silvia Colella and Andrea ListortiSolar RRL 8 (13) (2024)
https://doi.org/10.1002/solr.202400178
Textured p-type crystalline silicon surfaces obtained by multi-step plasma process for SHJ solar cells
M.L. Addonizio and A. AntonaiaVacuum 215 112284 (2023)
https://doi.org/10.1016/j.vacuum.2023.112284
Effect of Cryogenic Dry Etching on Minority Charge Carrier Lifetime in Silicon
Dmitry A. Kudryashov, Alexander S. Gudovskikh, Artem I. Baranov, Ivan A. Morozov and Anatoly O. Monastyrenkophysica status solidi (a) 217 (4) (2020)
https://doi.org/10.1002/pssa.201900534
Study on efficiency improvement of multi-crystalline silicon solar cell by removing by-product and plasma induced damage generated during reactive ion etching
Mu-joong Kim, Kwan Hong Min, Sungeun Park, et al.Current Applied Physics 20 (4) 519 (2020)
https://doi.org/10.1016/j.cap.2020.01.013
Developments in Surface Contamination and Cleaning: Applications of Cleaning Techniques
Dinesh P.R. Thanu, Endu Sekhar Srinadhu, Mingrui Zhao, Nikhil V. Dole and Manish KeswaniDevelopments in Surface Contamination and Cleaning: Applications of Cleaning Techniques 289 (2019)
https://doi.org/10.1016/B978-0-12-815577-6.00008-6
Relation between light trapping and surface topography of plasma textured crystalline silicon wafers
F. M. M. Souren, J. Rentsch and M. C. M. van de SandenProgress in Photovoltaics: Research and Applications 23 (3) 352 (2015)
https://doi.org/10.1002/pip.2439
Chemically active plasmas for surface passivation of Si photovoltaics
S.Q. Xiao, S. Xu, X.F. Gu, et al.Catalysis Today 252 201 (2015)
https://doi.org/10.1016/j.cattod.2015.03.007
Low-temperature plasma processing for Si photovoltaics
S.Q. Xiao, S. Xu and K. OstrikovMaterials Science and Engineering: R: Reports 78 1 (2014)
https://doi.org/10.1016/j.mser.2014.01.002
Developments in Surface Contamination and Cleaning
Galit Levitin, Karen Reinhardt and Dennis W. HessDevelopments in Surface Contamination and Cleaning 55 (2013)
https://doi.org/10.1016/B978-1-4377-7881-6.00002-8
Silicon homojunction solar cells via a hydrogen plasma etching process
S Q Xiao, S Xu, H P Zhou, et al.Journal of Physics D: Applied Physics 46 (10) 105103 (2013)
https://doi.org/10.1088/0022-3727/46/10/105103
Low Temperature Plasma Technology
Shaoqing Xiao, Shuyan Xu and Haiping ZhouLow Temperature Plasma Technology 287 (2013)
https://doi.org/10.1201/b15153-14
Plasma-aided fabrication in Si-based photovoltaic applications: an overview
S Q Xiao and S XuJournal of Physics D: Applied Physics 44 (17) 174033 (2011)
https://doi.org/10.1088/0022-3727/44/17/174033