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Cited article:

Plasma‐Based Technologies for Halide Perovskite Photovoltaics

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Study on efficiency improvement of multi-crystalline silicon solar cell by removing by-product and plasma induced damage generated during reactive ion etching

Mu-joong Kim, Kwan Hong Min, Sungeun Park, Hee-eun Song, Jeong In Lee, Kyung Taek Jeong, Jin-seong Park and Min Gu Kang
Current Applied Physics 20 (4) 519 (2020)
https://doi.org/10.1016/j.cap.2020.01.013

Effect of Cryogenic Dry Etching on Minority Charge Carrier Lifetime in Silicon

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Developments in Surface Contamination and Cleaning: Applications of Cleaning Techniques

Dinesh P.R. Thanu, Endu Sekhar Srinadhu, Mingrui Zhao, Nikhil V. Dole and Manish Keswani
Developments in Surface Contamination and Cleaning: Applications of Cleaning Techniques 289 (2019)
https://doi.org/10.1016/B978-0-12-815577-6.00008-6

Relation between light trapping and surface topography of plasma textured crystalline silicon wafers

F. M. M. Souren, J. Rentsch and M. C. M. van de Sanden
Progress in Photovoltaics: Research and Applications 23 (3) 352 (2015)
https://doi.org/10.1002/pip.2439