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Applying Quantum Cascade Laser Spectroscopy in Plasma Diagnostics
Jürgen Röpcke, Paul Davies, Stephan Hamann, Mario Hannemann, Norbert Lang and Jean-Pierre Van Helden Photonics 3(3) 45 (2016) https://doi.org/10.3390/photonics3030045
Room temperature operation of a deep etched buried heterostructure photonic crystal quantum cascade laser
Romain Peretti, Valeria Liverini, Martin J. Süess, Yong Liang, Pierre‐ Baptiste Vigneron, Johanna M. Wolf, Christopher Bonzon, Alfredo Bismuto, Wondwosen Metaferia, Manavaimaran Balaji, Sebastian Lourdudoss, Emilio Gini, Mattias Beck and Jérome Faist Laser & Photonics Reviews 10(5) 843 (2016) https://doi.org/10.1002/lpor.201600047
Y. Liang, R. Peretti, V. Liverini, M. J. Süess, P-B. Vigneron, J. M. Wolf, C. Bonzon, A. Bismuto, S. Lourdudoss, W. Metaferia, M. Balaji, E. Gini, M. Beck and J. Faist LTh3E.2 (2016) https://doi.org/10.1364/LACSEA.2016.LTh3E.2
On treatment of ultra-low-k SiCOH in CF4 plasmas: correlation between the concentration of etching products and etching rate
Quantum cascade laser based monitoring of CF2 radical concentration as a diagnostic tool of dielectric etching plasma processes
M. Hübner, N. Lang, S. Zimmermann, S. E. Schulz, W. Buchholtz, J. Röpcke and J. H. van Helden Applied Physics Letters 106(3) (2015) https://doi.org/10.1063/1.4906306
In Situ Monitoring Capabiities of Quantum Cascade Laser Absorption Spectroscopy in Industrial Plasma Processes
N. Lang, U. Macherius, S. Glitsch, H. Zimmermann, J. Röpcke and J. H. van Helden Contributions to Plasma Physics 55(10) 758 (2015) https://doi.org/10.1002/ctpp.201510016
Fabrication of a Glow Discharge Plasma-Based Ionization Gas Sensor Using Multiwalled Carbon Nanotubes for Specific Detection of Hydrogen at Parts Per Billion Levels
Time-Resolved Quantum Cascade Laser Absorption Spectroscopy of Pulsed Plasma Assisted Chemical Vapor Deposition Processes Containing BCl3
Norbert Lang, Frank Hempel, Siegfried Strämke and Jürgen Röpcke Japanese Journal of Applied Physics 50(8S1) 08JB04 (2011) https://doi.org/10.7567/JJAP.50.08JB04
Time-Resolved Quantum Cascade Laser Absorption Spectroscopy of Pulsed Plasma Assisted Chemical Vapor Deposition Processes Containing BCl$_{3}$
Norbert Lang, Frank Hempel, Siegfried Strämke and Jürgen Röpcke Japanese Journal of Applied Physics 50(8) 08JB04 (2011) https://doi.org/10.1143/JJAP.50.08JB04
Infrared Laser Absorption Spectroscopy with Quantum Cascade Lasers in Industrial Application
Oxidation of NO Into NO2 by Surface Adsorbed O Atoms
O. Guaitella, M. Hübner, D. Marinov, V. Guerra, C.D. Pintassilgo, S. Welzel, J. Röpcke and A. Rousseau Contributions to Plasma Physics 51(2-3) 176 (2011) https://doi.org/10.1002/ctpp.201000068
Plasma diagnostics and device properties of AlGaN/GaN HEMT passivated with SiN deposited by plasma-enhanced chemical vapour deposition