0.7 mL of silicon deposited on NaCl/Ag(110) at 140 °C followed by a post-annealing at 200 °C (a) STM image (21.5 × 21.5 nm², U = –0.7 V, I = 0.8 nA) of a Si ad-layer. (b) High-resolution STM image (5 × 5 nm², U = –0.04 V, I = 2.6 nA) showing the atomic structure of the deposited silicon self-assembled to form honeycomb-like structure. (c) LEED pattern showing diffraction spots of Ag, NaCl, and Si in black, blue, and red circles, respectively, (d) STM image (7.5 × 7.5 nm², U = –0.6 V, I = 0.87 nA) of a silicon ad-layer grown on a NaCl film with square symmetry.