Mini-review

Review on fabrication methods of SrTiO₃-based two dimensional conductive interfaces

Shaanxi Key Laboratory of Condensed Matter Structures and Properties and MOE Key Laboratory of Materials Physics and Chemistry under Extraordinary Conditions, School of Physical Science and Technology, Northwestern Polytechnical University, Xi'an 710072, P.R. China

^* e-mail: jinkx@nwpu.edu.cn

Received: 13 October 2020
Received in final form: 21 December 2020
Accepted: 8 January 2021
Published online: 18 February 2021

Abstract

The SrTiO₃-based two dimensional conductive interfaces have attracted considerable attention in the last decade owing to the emergence of novel physical phenomena. These heterointerfaces are generally formed by depositing the films on SrTiO₃ substrates. Particularly, the controllable and precise characteristics of pulsed laser deposition (PLD) allow the deposition of an atomically flat oxide films and control the growth layer-by-layer. Recently, the deposition methods of atomic layer deposition (ALD) and spin coating have exhibited an excellent practicability and many interesting results are obtained by analyzing the chemical reaction pathway. In addition, the surface treatment methods (such as high vacuum annealing, Ar⁺ ion irradiation and photoirradiation etc.) can also obtain the two dimensional conductive SrTiO₃ effectively. Furthermore, owing to the difference of fabrication method, the SrTiO₃-based two dimensional conductive interfaces significantly show different performances of the same oxides. Thus, this review compares the characteristics of different methods in preparing the SrTiO₃-based interfaces. The appropriate method and process is the precondition to obtain high-quality oxide films and establish the foundation for the development of oxide and interface electronics.