Eur. Phys. J. Appl. Phys.
Volume 71, Number 3, September 2015
|Number of page(s)||13|
|Section||Surfaces and Interfaces|
|Published online||27 August 2015|
A review-application of physical vapor deposition (PVD) and related methods in the textile industry
Department of Textile, Arak Branch, Islamic Azad University, Arak, Iran
2 Plasma Physics Research Center, Science and Research Branch, Islamic Azad University, Tehran, Iran
a e-mail: email@example.com
Revised: 22 February 2015
Accepted: 23 July 2015
Published online: 27 August 2015
Physical vapor deposition (PVD) is a coating process in which thin films are deposited by the condensation of a vaporized form of the desired film material onto the substrate. The PVD process is carried out in a vacuum. PVD processes include different types, such as: cathode arc deposition, electron beam physical vapor deposition, evaporative deposition, sputtering, ion plating and enhanced sputtering. In the PVD method, the solid coating material is evaporated by heat or by bombardment with ions (sputtering). At the same time, a reactive gas is also introduced; it forms a compound with the metal vapor and is deposited on the substrate as a thin film with highly adherent coating. Such coatings are used in a wide range of applications such as aerospace, automotive, surgical, medical, dyes and molds for all manner of material processing, cutting tools, firearms, optics, thin films and textiles. The objective of this work is to give a comprehensive description and review of the science and technology related to physical vapor deposition with particular emphasis on their potential use in the textile industry. Physical vapor deposition has opened up new possibilities in the modification of textile materials and is an exciting prospect for usage in textile design and technical textiles. The basic principle of PVD is explained and the major applications, particularly sputter coatings in the modification and functionalization of textiles, are introduced in this research.
© EDP Sciences, 2015
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