Issue |
Eur. Phys. J. Appl. Phys.
Volume 65, Number 1, January 2014
|
|
---|---|---|
Article Number | 10101 | |
Number of page(s) | 5 | |
Section | Semiconductors and Devices | |
DOI | https://doi.org/10.1051/epjap/2013130236 | |
Published online | 27 January 2014 |
https://doi.org/10.1051/epjap/2013130236
Non-ohmic hopping conduction of a diode base extracted from the diode current-voltage characteristics
1
V.E. Lashkaryov Institute of Semiconductor Physics, Nauki Ave 41, 03028 Kiev, Ukraine
2 International Laboratory of High Magnetic Fields and Low Temperatures, Wroclaw, Poland
a e-mail: borblik@isp.kiev.ua
Received:
14
May
2013
Revised:
6
September
2013
Accepted:
16
December
2013
Published online:
27
January
2014
Using the method of extracting a series resistance from a p-n diode current-voltage characteristics developed earlier, parameters of low-temperature non-ohmic conduction in bases of two types of silicon diodes have been studied. In the diode of the first type, with finite value of impurity ionization energy, low-temperature impurity breakdown in the diode base is accompanied by hysteresis of its conduction; in the diode of the second type, the impurity breakdown occurs in soft form. In the pre-breakdown region, the results obtained for the diodes of both types, agree completely with existing picture of non-ohmic hopping conduction in spite of significant space inhomogeneity of the diode structures and non-equilibrium character of the transport in them. In the post-breakdown region, the certain peculiarities are available. For the first time the activationless hopping conduction has been revealed in crystalline silicon.
© EDP Sciences, 2014
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