Characterization of microroughness parameters in Cu-C nanocomposite prepared by co-deposition of RF-sputtering and RF-PECVD

¹ Department of Physics, Kermanshah Branch, Islamic Azad University, Kermanshah, Iran
² Plasma Physics Research Center, Science and Research Branch, Islamic Azad University, Tehran, Iran
³ Young Researchers and Elite Club, Kermanshah Branch, Islamic Azad University, Kermanshah, Iran

^a e-mail: shahram22s2000@yahoo.com

Received: 7 March 2013
Revised: 17 June 2013
Accepted: 26 August 2013
Published online: 3 October 2013

Abstract

The morphological parameter of a thin film surface can be characterized by power spectral density (PSD) function which provides a better description on topography rather than the root mean square (RMS) and super structure contributions. Through the present study, nanoparticle copper-carbon composite films were prepared by co-deposition of RF-sputtering and RF-PECVD method using acetylene gas and copper target. These films’ surface roughnesses were determined by using an atomic force microscope (AFM). The carbon content of the films was obtained by Rutherford back scattering (RBS) which was varied from 5% to 73%. The power values of PSD for the AFM data were determined by the fast Fourier transform (FFT) algorithms. The effect of carbon on the surface roughness of thin films was investigated. Changes in the relationship between the resistivity and fractal dimension were observed for investigating films.