Eur. Phys. J. Appl. Phys.
Volume 62, Number 2, May 2013
|Number of page(s)||5|
|Section||Semiconductors and Devices|
|Published online||30 April 2013|
Selective plasma etching treatment of the screen-printed carbon nanotube cold cathode
Hubei Province Key Laboratory of Refractories and Ceramics, Wuhan University of Science and Technology, Wuhan 430081, P.R. China
a e-mail: firstname.lastname@example.org
Revised: 31 October 2012
Accepted: 18 February 2013
Published online: 30 April 2013
A high-precision printing and patterning carbon nanotube (CNT) cathode was prepared using the screen-printing method. Selective plasma etchings were introduced to improve field emission properties of the CNT cathode through the reactive ion etching (RIE) system. The field emission characteristics and mechanism of the cathode after etching treatment were studied. It was found that the reactive ion etching could effectively expose plentiful CNTs inside the cathode and protrude them from the surface. Moreover, with the increase of RIE operation pressure, CNT cathode field emission behavior changed from metal-insulation medium-vacuum (MIV) to a classical metallic-microprotrusion (MM) structure field emission model. The results showed that only the cathode with appropriate RIE operation pressure etching has a low operation field and a high emission current density.
© EDP Sciences, 2013
Current usage metrics show cumulative count of Article Views (full-text article views including HTML views, PDF and ePub downloads, according to the available data) and Abstracts Views on Vision4Press platform.
Data correspond to usage on the plateform after 2015. The current usage metrics is available 48-96 hours after online publication and is updated daily on week days.
Initial download of the metrics may take a while.