| Issue |
Eur. Phys. J. Appl. Phys.
Volume 59, Number 1, July 2012
|
|
|---|---|---|
| Article Number | 10801 | |
| Number of page(s) | 5 | |
| Section | Plasma, Discharges and Processes | |
| DOI | https://doi.org/10.1051/epjap/2012110306 | |
| Published online | 03 August 2012 | |
https://doi.org/10.1051/epjap/2012110306
Influence of copper thin film as an electrode on the DC electrical breakdown in the presence of Ar and air
Department of Physics, Karaj Branch, Islamic Azad University, Karaj, Iran
a e-mail: kiomars.yaserian@kiau.ac.ir
Received:
30
July
2011
Revised:
22
April
2012
Accepted:
25
June
2012
Published online:
3
August
2012
Electrical breakdown for low pressure argon gas and air, using copper thin films as the electrodes, was investigated. A specially designed cathode was built from copper thin film deposited on glass by a magnetron sputtering system creating the breakdown between those electrodes. The left side of Paschen’s curve and ionization coefficient η as well as the effective electron emission coefficient γ was obtained with respect to the variation of reduced electric fields for argon gas and air for different thin films thicknesses. It is concluded that reducing the thin film thickness as an electrode leads to a decrease of breakdown voltage and amplifying secondary electron emission. In addition, the influence of the gas type on dependence of breakdown characteristics on the electrode thickness was investigated.
© EDP Sciences, 2012
Current usage metrics show cumulative count of Article Views (full-text article views including HTML views, PDF and ePub downloads, according to the available data) and Abstracts Views on Vision4Press platform.
Data correspond to usage on the plateform after 2015. The current usage metrics is available 48-96 hours after online publication and is updated daily on week days.
Initial download of the metrics may take a while.