Control of the substrate temperature using a triode magnetron sputtering system

¹ Santa Catarina State University, Plasmas Physics Laboratory, 89223-100, Joinville, SC, Brazil
² Technological Institute of Aeronautics, Plasma Science and Technology Laboratory, 12228-900, S.J. dos Campos, SP, Brazil

Corresponding author: daduarte@ita.br

Received: 8 March 2010
Revised: 3 July 2010
Accepted: 24 August 2010
Published online: 30 November 2010

Abstract

The bombardment of ions and electrons at the substrate has been studied by varying the magnetic field distribution and the grid-target distance in a triode magnetron sputtering system. The substrate temperature was correlated with the substrate current density and with the type of species bombarding the substrate. The results indicate a possibility to modify and control the bombardment at the substrate surface from predominantly electronic to predominantly ionic, which increases the substrate temperature from 383 K to 473 K, respectively.