| Issue |
Eur. Phys. J. Appl. Phys.
Volume 48, Number 3, December 2009
|
|
|---|---|---|
| Article Number | 30503 | |
| Number of page(s) | 5 | |
| Section | Surfaces, Interfaces and Films | |
| DOI | https://doi.org/10.1051/epjap/2009183 | |
| Published online | 30 October 2009 | |
https://doi.org/10.1051/epjap/2009183
Electrical properties and Kerr effect study of evaporated Fe/Si and Fe/glass thin films
1
Département de Physique, Université Ferhat Abbas, 19000 Setif,
Algeria
2
Centre de Recherche Nucléaire d'Alger (CRNA), 16000 Alger,
Algeria
3
Joint Laboratory LEMAC, IEMN CNRS 8520, École Centrale de Lille,
59651 Villeneuve d'Ascq, France
Corresponding author: A_Layadi@yahoo.fr
Received:
1
August
2009
Accepted:
28
September
2009
Published online:
30
October
2009
Electrical and magnetic properties were studied for evaporated Fe thin films
on glass and Si substrates. These properties were investigated by means of
the four point probe and the magneto-optical Kerr effect techniques.
Rutherford backscattering (RBS) and scanning electron microscopy (SEM)
experiments show no interdiffusion at the interface Fe/Si for these samples.
The electrical resistivity 
is found to be larger in Fe/glass than in
Fe/Si for the same thickness. Diffusion at the grain boundaries seems to be
the dominant factor in the values in this 6 to 110 nm thickness
range; the reflection coefficient is smaller in Fe/glass (R ≈ 0.40)
than in Fe/Si(100) (R ≈ 0.65). Saturation field and strain values
confirm that Fe films have a stress induced magnetic anisotropy. Coercive
field HC values range from 2.45 Oe for Fe/Si(100) to 17.65 Oe for
Fe/Si(111) for the same Fe thickness (45 nm).
PACS: 75.50.Bb – Fe and its alloys / 75.70.Ak – Magnetic properties of monolayers and thin films / 73.61.-r – Electrical properties of specific thin films / 75.60.Jk – Magnetization reversal mechanisms
© EDP Sciences, 2009
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