| Issue |
Eur. Phys. J. Appl. Phys.
Volume 34, Number 2, May 2006
15th International Colloquium on Plasma processes (CIP 2005)
|
|
|---|---|---|
| Page(s) | 157 - 163 | |
| Section | Plasma, Discharge and Processes | |
| DOI | https://doi.org/10.1051/epjap:2006051 | |
| Published online | 25 May 2006 | |
https://doi.org/10.1051/epjap:2006051
Characterization of carbon nanotubes and carbon nitride nanofibres synthesized by PECVD
Institut des Matériaux Jean Rouxel, IMN Nantes, 2 rue de la
Houssinière, BP 32229,
44322 Nantes Cedex, France
Corresponding author: sebastien.point@cnrs-imn.fr
Received:
6
February
2006
Revised:
16
March
2006
Accepted:
24
March
2006
Published online:
25
May
2006
This paper presents a novel dual plasma enhanced chemical vapor deposition (PECVD) process developed to grow carbon nitride nanofibres (CN-NFs) at room temperature (RT) and its basic version used to grow multi-walled carbon nanotubes (MWCNTs) at temperatures as low as 550 °C. The dual process alternates two low pressure-high density plasmas, one inductively coupled (ICP) and the other one excited by distributed electron cyclotron resonance (DECR). MWCNTs can be synthesized using only the DECR plasma source. The paper focuses on the comparison between CN-NFs and MWCNTs detailing their structure as revealed by transmission electron microscopy (TEM), X-ray photo electron spectroscopy (XPS) and Raman spectroscopy.
PACS: 81.07.De – Nanotubes / 81.15.-z – Methods of deposition of films and coatings; film growth and epitaxy / 81.15.Gh – Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, etc.) / 61.46.Df – Nanoparticles
© EDP Sciences, 2006
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