Eur. Phys. J. AP
Volume 22, Number 1, April 2003
|Page(s)||11 - 14|
|Section||Surfaces, Interfaces and Films|
|Published online||25 February 2003|
High-quality GaN on intentionally roughened c-sapphire
Department of Materials Engineering, Ben-Gurion University of the Negev,
Beer-Sheva 84105, Israel
2 Materials Department, University of California, Santa Barbara, CA 93106, USA
3 Department of Electrical Engineering, Technion – Israel Institute of Technology, Haifa 32000, Israel
Corresponding author: email@example.com
Revised: 24 November 2002
Accepted: 19 December 2002
Published online: 25 February 2003
GaN films were grown using metal-organic chemical vapor deposition (MOCVD) on intentionally roughened c-sapphire in order to study the effect of the substrate roughness. Controlled substrate damage was achieved by exposing the substrate surfaces to controlled amounts of trimethylgallium followed by exposure to hydrogen at elevated temperature. The bulk film quality was studied by high-resolution X-ray diffraction and the surface topography was examined by atomic force microscopy. It was observed that mild substrate roughness (surface pit depth up to 30 nm) does not have a significant effect on the bulk film quality nor the GaN surface topography, and that recovery of the surface roughness is observed in very early stages of film growth. Cross sectional transmission electron microscopy confirmed that MOCVD GaN grown on inclined sidewalls etched in c-sapphire maintained the epitaxial relationship despite the substrate miscut of ca. 15° with respect to the c-axis.
PACS: 68.35.Ct – Interface structure and roughness / 68.55.Ac – Nucleation and growth: microscopic aspects
© EDP Sciences, 2003
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