Eur. Phys. J. AP
Volume 20, Number 3, December 2002ACO: Action Coordonnée Optique
|Page(s)||213 - 218|
|Section||Laser, Optics, Optoelectronics and Nanophotonics|
|Published online||15 November 2002|
Dynamic UV microstereolithography
Département de Chimie Physique des Réactions, ENSIC, 1 rue Grandville, BP 451, 54001 Nancy Cedex, France
2 Laboratoire d'Optique P.M. Duffieux, Université de Franche-Comté, 25030 Besançon Cedex, France
Corresponding author: email@example.com
Revised: 15 July 2002
Accepted: 25 July 2002
Published online: 15 November 2002
A new process of microstereolithography to manufacture freeform solid three-dimensional micro-components with outer dimensions in the millimetre size range is presented. The process, based on the use of a liquid crystal display as a dynamic mask generator, works with conventional industrial UV-sensitive stereolithographic materials. The main innovation of the process consists in using the optical frequency up-conversion of images from the visible to the UV range in order to overcome the opacity of LCD's in the UV domain. 400 × 400 points up-converted images have been obtained to generate solid three-dimensional objects.
PACS: 82.50.Hp – Processes caused by visible and UV light / 42.30.Va – Image forming and processing / 42.65.Ky – Harmonic generation, frequency conversion
© EDP Sciences, 2002
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