Issue |
Eur. Phys. J. AP
Volume 20, Number 2, November 2002
Instrumentation Interdisciplinary Colloque (C2I 2001)
|
|
---|---|---|
Page(s) | 151 - 158 | |
Section | Instrumentation and Metrology | |
DOI | https://doi.org/10.1051/epjap:2002086 | |
Published online | 25 October 2002 |
https://doi.org/10.1051/epjap:2002086
Study of the interaction between heavy ions and integrated circuits using a pulsed laser beam*
IXL, ENSEIRB-Université Bordeaux 1, 33405 Talence, France
Corresponding author: lewis@ixl.u-bordeaux.fr
Received:
20
November
2001
Revised:
16
July
2002
Accepted:
25
July
2002
Published online:
25
October
2002
A new pulsed laser beam equipment dedicated to the characterization of integrated circuit is presented. Using ultra-short laser pulses is a convenient way to simulate experimentally the spatial environment of integrated circuits when interactions with heavy ions occur. This experimental set-up can be considered as a complementary tool for particle accelerators to evaluate the hardness assurance of integrated circuits for space applications. These particles generate temporally electrical disturbance called Single Event Effect (SEE). The theoretical approach of an equivalence between heavy ions and a laser pulses is discussed. The experimental set-up and some relevant operational methodologies are presented. Experimental results demonstrate that the induced electrical responses due to an heavy ion or a laser pulse are quite similar. Some sensitivity mappings of integrated circuits provided by this test bench illustrate the capabilities and the limitations of this laser-based technique. Contrary to the particle accelerators, it provides useful information concerning the spatial and temporal dependences of SEE mechanisms.
PACS: 85.40.Qx – Microcircuit quality, noise, performance, and failure analysis
© EDP Sciences, 2002
Current usage metrics show cumulative count of Article Views (full-text article views including HTML views, PDF and ePub downloads, according to the available data) and Abstracts Views on Vision4Press platform.
Data correspond to usage on the plateform after 2015. The current usage metrics is available 48-96 hours after online publication and is updated daily on week days.
Initial download of the metrics may take a while.