Eur. Phys. J. AP
Volume 12, Number 3, December 2000
|Page(s)||223 - 229|
|Published online||15 December 2000|
Nanoimprint and micro-contact printing tri-layer processes*
Laboratoire de Microstructures et de Microélectronique, CNRS, 196 avenue Henri Ravera, 92225
Corresponding author: yong.chen@L2m.cnrs.fr
Revised: 24 August 2000
Accepted: 24 August 2000
Published online: 15 December 2000
Replication of patterns at a nanometer scale is a challenge for both advanced optical lithography and post-optical techniques. Considerable industrial effort has been devoted to the so-called leading-edge optical methods and the next generation lithography techniques. In parallel, a number of low-cost techniques such as nanoimprint and micro-contact printing are being investigated. In these methods, pattern replication is performed in non-conventional ways so that diffraction and scattering problems are no longer relevant. However, several other critical issues have to be studied. This paper describes two tri-layer pattern-transfer techniques, which can be used to improve the process latitude and the process compatibility. Pattern replication and lift-off transfer with feature sizes down to 30 nm and 150 nm have been achieved respectively by nanoimprint and micro-contact printing. As application examples, high-density magnetic dot structures are obtained and studied by measuring magneto-optical Kerr hysteresis loops.
PACS: 85.40.Ux – Nanometer-scale fabrication technology / 75.70.Kw – Domain structure (including, magnetic bubbles)
© EDP Sciences, 2000
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