| Issue |
Eur. Phys. J. AP
Volume 8, Number 1, October 1999
|
|
|---|---|---|
| Page(s) | 29 - 35 | |
| DOI | https://doi.org/10.1051/epjap:1999226 | |
| Published online | 15 October 1999 | |
https://doi.org/10.1051/epjap:1999226
Ultraviolet self-generating relief micro-optical elements through crosslinking photopolymerization of liquid resins
1
Centro de Investigaciones en Optica, Apartado Postal 1-948, Leon Gto. 37000, Mexico
2
Département de Photochimie Générale (UMR 7525 du CNRS), ENSCMu, 3 rue A. Werner,
68093 Mulhouse Cedex, France
Corresponding author: c.barghorn@univ-mulhouse.fr
Received:
22
March
1999
Revised:
9
July
1999
Accepted:
22
July
1999
Published online: 15 October 1999
The use of a self-processing dry photopolymer layer capable of memorizing optical information as a local change in thickness, is proposed for the fabrication of microlenses, binary holograms and gratings. Relief micro-optical elements are generated by direct imagewise exposure through a mask. A gradient of chemical composition and a gradient of surface free energy cause the transfer of reactive species between dark and illuminated areas. Contrary to conventional lithographic techniques that require wet chemical post-treatment to remove parts of the photoresist material, the fully self-processing character of this technique makes the record available in situ and immediately after exposure.
PACS: 82.35.+t – Polymer reactions and polymerization / 42.40.-i – Holography / 42.70.-a – Optical materials
© EDP Sciences, 1999
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