Eur. Phys. J. AP
Volume 8, Number 1, October 1999
|Page(s)||29 - 35|
|Published online||15 October 1999|
Ultraviolet self-generating relief micro-optical elements through crosslinking photopolymerization of liquid resins
Centro de Investigaciones en Optica, Apartado Postal 1-948, Leon Gto. 37000, Mexico
2 Département de Photochimie Générale (UMR 7525 du CNRS), ENSCMu, 3 rue A. Werner, 68093 Mulhouse Cedex, France
Corresponding author: email@example.com
Revised: 9 July 1999
Accepted: 22 July 1999
Published online: 15 October 1999
The use of a self-processing dry photopolymer layer capable of memorizing optical information as a local change in thickness, is proposed for the fabrication of microlenses, binary holograms and gratings. Relief micro-optical elements are generated by direct imagewise exposure through a mask. A gradient of chemical composition and a gradient of surface free energy cause the transfer of reactive species between dark and illuminated areas. Contrary to conventional lithographic techniques that require wet chemical post-treatment to remove parts of the photoresist material, the fully self-processing character of this technique makes the record available in situ and immediately after exposure.
PACS: 82.35.+t – Polymer reactions and polymerization / 42.40.-i – Holography / 42.70.-a – Optical materials
© EDP Sciences, 1999
Current usage metrics show cumulative count of Article Views (full-text article views including HTML views, PDF and ePub downloads, according to the available data) and Abstracts Views on Vision4Press platform.
Data correspond to usage on the plateform after 2015. The current usage metrics is available 48-96 hours after online publication and is updated daily on week days.
Initial download of the metrics may take a while.