| Issue |
Eur. Phys. J. AP
Volume 5, Number 3, March 1999
|
|
|---|---|---|
| Page(s) | 237 - 242 | |
| DOI | https://doi.org/10.1051/epjap:1999134 | |
| Published online | 15 March 1999 | |
https://doi.org/10.1051/epjap:1999134
Determination of the electron mean free path in the 1–1.8 eV energy range in thin gold layers using ballistic electron emission microscopy
CEMES/CNRS, 29 rue J. Marvig, B.P. 4347, 31055 Toulouse Cedex 4, France
Corresponding author: coratger@cemes.fr
Received:
21
September
1998
Revised:
15
December
1998
Accepted:
15
December
1998
Published online: 15 March 1999
Electron mean free path (λa) has been investigated using Ballistic Electron Emission Microscopy (BEEM). Using the average collector current computed from large scale BEEM images and a model in which the current exponentially decreases in terms of metal thickness, a constant value of λa = 11 nm has been calculated in the 1–1.8 eV electron energy range. On small scale images, the study of well-defined BEEM doMayns shows that either λa or the interface transmission factor (or both) may differ from their average values. These local variations from one grain to another are interpreted as interface defects and channeling of the electron beam due to the electronic and crystallographic of the gold layer.
PACS: 61.16.-d – Electron, ion, and scanning probe microscopy / 73.40.Ns – Metal-nonmetal contacts
© EDP Sciences, 1999
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