Issue |
Eur. Phys. J. Appl. Phys.
Volume 56, Number 1, October 2011
|
|
---|---|---|
Article Number | 11301 | |
Number of page(s) | 6 | |
Section | Surfaces and Interfaces | |
DOI | https://doi.org/10.1051/epjap/2011110235 | |
Published online | 28 September 2011 |
https://doi.org/10.1051/epjap/2011110235
Resonant photoemission of rare earth doped GaN thin films
1
Air Force Institute of Technology, 2950 Hobson Way, Wright Patterson Air Force Base, OH 45433, USA
2
Department of Physics and Institute for Functional Nanomaterials, University of Puerto Rico, San Juan, PR 00931, USA
3
The J. Bennett Johnston Sr. Center for Advanced Microstructures and Devices, Louisiana State University, 6890 Jefferson Highway, Baton Rouge, LA 70806, USA
4
Department of Physics and Astronomy, Nebraska Center for Materials and Nanoscience, Theodore Jorgensen Hall, 855 North 16th Street, University of Nebraska, P.O. Box 880299, Lincoln, NE 68588-0299, USA
a e-mail: stephen.mchale@afit.edu
b e-mail: john.mcclory@afit.edu
Received:
26
May
2011
Revised:
7
June
2011
Accepted:
21
June
2011
Published online:
28
September
2011
The 4d → 4f Fano resonances for various rare earth doped GaN thin films (RE = Gd, Er, Yb) were investigated using synchrotron photoemission spectroscopy. The resonant photoemission Fano profiles show that the major Gd and Er rare earth 4f weight is at about 5–6 eV below the valence band maximum, similar to the 4f weights in the valence band of many other rare earth doped semiconductors. For Yb, there is very little resonant enhancement of the valence band of Yb doped GaN, consistent with a largely 4f14 occupancy.
© EDP Sciences, 2011
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