Annealing effect in DC and RF sputtered ITO thin films L. Kerkache, A. Layadi, E. Dogheche and D. Rémiens Eur. Phys. J. Appl. Phys., 39 1 (2007) 1-5 Published online: 14 July 2007 DOI: 10.1051/epjap:2007113