The European Physical Journal Applied Physics (EPJ AP)

Characterization of SOI wafers by synchrotron X-ray topography

T. Shimura, K. Fukuda, K. Yasutake and M. Umeno

Eur. Phys. J. Appl. Phys., 27 1-3 (2004) 439-442

Published online: 15 July 2004

DOI: 10.1051/epjap:2004067

T. Shimura

K. Fukuda

K. Yasutake

M. Umeno

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