The European Physical Journal Applied Physics (EPJ AP)

Reactive etching of SiC by energetic CF₃: molecular dynamics simulation

F. Gou, Z. Chen and C. Zhiqian

Eur. Phys. J. Appl. Phys., 38 2 (2007) 129-134

Published online: 21 March 2007

DOI: 10.1051/epjap:2007058

F. Gou

Z. Chen

C. Zhiqian

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