The European Physical Journal Applied Physics (EPJ AP)

Rapid crystallization of amorphous silicon utilizing a VHF plasma annealing at atmospheric pressure

H. Shirai, Y. Sakurai, M. Yeo, T. Kobayashi and T. Ishikawa

Eur. Phys. J. Appl. Phys., 37 3 (2007) 315-322

Published online: 24 January 2007

DOI: 10.1051/epjap:2007025

H. Shirai

Y. Sakurai

M. Yeo

T. Kobayashi

T. Ishikawa

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