The European Physical Journal Applied Physics (EPJ AP)

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Low-temperature deposition of weakly-stressed nanocrystalline silicon films by reactive magnetron sputtering

A. Ben Othman, Y. Leconte, P. Marie, K. Zellama, C. Goncalves, X. Portier, M. Daouahi, H. Bouchriha and R. Rizk

Eur. Phys. J. Appl. Phys., 29 1 (2005) 33-38

Published online: 21 December 2004

DOI: 10.1051/epjap:2004207

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The European Physical Journal Applied Physics (EPJ AP)

Editors-in-Chief: Vincent Mauchamp and Philippe Moreau - Editorial board
ISSN: 1286-0042 - eISSN: 1286-0050
Frequency: monthly
Copyright / Published by: EDP Sciences

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