Low temperature drive-in of surface-deposited copper in silicon wafers M. L. Polignano, D. Caputo, C. Carpanese, G. Salvà and L. Vanzetti Eur. Phys. J. Appl. Phys., 27 1-3 (2004) 435-438 Published online: 15 July 2004 DOI: 10.1051/epjap:2004138