The European Physical Journal Applied Physics (EPJ AP)

p-type doping by platinum diffusion in low phosphorus doped silicon

L. Ventura, B. Pichaud, W. Vervisch and F. Lanois

Eur. Phys. J. AP, 23 1 (2003) 33-37

Published online: 29 November 2002

DOI: 10.1051/epjap:2002114

L. Ventura

B. Pichaud

W. Vervisch

F. Lanois

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