The European Physical Journal Applied Physics (EPJ AP)

Ion implantation-reduced diffusion length in HgCdTe

P. Lévêque, A. Declémy and P. O. Renault

Eur. Phys. J. AP, 2 3 (1998) 223-226

Published online: 15 June 1998

DOI: 10.1051/epjap:1998187

P. Lévêque

A. Declémy

P. O. Renault

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