Measure and analysis of 4H-SiC Schottky barrier height with Mo contacts Teng Zhang, Christophe Raynaud and Dominique Planson Eur. Phys. J. Appl. Phys., 85 1 (2019) 10102 Published online: 22 February 2019 DOI: 10.1051/epjap/2018180282