The European Physical Journal Applied Physics (EPJ AP)

Ion flux-film structure relationship during magnetron sputtering of WO₃

A. Hemberg, S. Konstantinidis, F. Renaux, J.P. Dauchot and R. Snyders

Eur. Phys. J. Appl. Phys., 56 2 (2011) 24016

Published online: 28 October 2011

DOI: 10.1051/epjap/2011110200

A. Hemberg

S. Konstantinidis

F. Renaux

J.P. Dauchot

R. Snyders

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