The European Physical Journal Applied Physics (EPJ AP)

Annealing effects on microstructures of HfAlO/Si with a Ti capping layer

L. Wan, X. Gong, X. H. Cheng, H. Luo, Y. Huang, B. Tang and J. Shangguan

Eur. Phys. J. Appl. Phys., 48 2 (2009) 20302

Published online: 02 October 2009

DOI: 10.1051/epjap/2009164

L. Wan

X. Gong

X. H. Cheng

H. Luo

Y. Huang

B. Tang

J. Shangguan

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