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Ultra thin gate oxide characterization

D. Roy, S. Bruyere, D. Rideau, F. Gilibert, L. Giguerre, F. Monsieur, G. Gouget and P. Scheer

Eur. Phys. J. Appl. Phys., 27 1-3 (2004) 21-27

DOI: https://doi.org/10.1051/epjap:2004072

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