Properties study of silicon carbide thin films prepared by electron cyclotron resonance plasma technologyA. Valovič, J. Huran, M. Kučera, A.P. Kobzev and Š. GažiEur. Phys. J. Appl. Phys., 56 2 (2011) 24013DOI: https://doi.org/10.1051/epjap/2011110153