A simple model for the deposition of W-O coatings by reactive gas pulsing processN. M. G. Parreira, T. Polcar, N. J. M. Carvalho and A. CavaleiroEur. Phys. J. Appl. Phys., 43 3 (2008) 321-325DOI: https://doi.org/10.1051/epjap:2008068
