Rapid crystallization of amorphous silicon utilizing a VHF plasma annealing at atmospheric pressureH. Shirai, Y. Sakurai, M. Yeo, T. Kobayashi and T. IshikawaEur. Phys. J. Appl. Phys., 37 3 (2007) 315-322DOI: https://doi.org/10.1051/epjap:2007025
