Titanium carbide film deposition on silicon wafers by pulsed KrF laser ablation of titanium in low-pressure CH4 and C2H2 atmospheresE. D'Anna, M. Fernández, G. Leggieri, A. Luches, A. Zocco and G. MajniEur. Phys. J. Appl. Phys., 28 2 (2004) 159-163DOI: https://doi.org/10.1051/epjap:2004174
