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Calculation of boron segregation at the Si(100)/SiO₂ interface

M. Furuhashi, T. Hirose, H. Tsuji, M. Tachi and K. Taniguchi

Eur. Phys. J. Appl. Phys., 27 1-3 (2004) 163-166

DOI: https://doi.org/10.1051/epjap:2004136

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