Article citations

Download citation

Distribution and properties of oxide precipitates in annealed nitrogen doped 300 mm Si wafers

V. D. Akhmetov, H. Richter, W. Seifert, O. Lysytskiy, R. Wahlich, T. Müller and M. Reiche

Eur. Phys. J. Appl. Phys., 27 1-3 (2004) 159-161

DOI: https://doi.org/10.1051/epjap:2004084

Back to the article