Benchmarking analytical electron ptychography methods for the low-dose imaging of beam-sensitive materialsHoelen L. Lalandec Robert, Max Leo Leidl, Knut Müller-Caspary and Jo VerbeeckEur. Phys. J. Appl. Phys., 100 (2025) 20DOI: https://doi.org/10.1051/epjap/2025018
