Conventional and high power impulse magnetron sputtering deposition of tantalum nitride films: a molecular dynamics approachPascal Brault, Marjorie Cavarroc-Weimer, Sara Fazeli and Nicolas FroloffEur. Phys. J. Appl. Phys., 100 (2025) 12DOI: https://doi.org/10.1051/epjap/2025012
