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Titanium dioxide thin films deposition by direct current hollow cathode magnetron sputtering

D. A. Duarte, M. Massi, A. S. da Silva Sobrinho, H. S. Maciel, K. Grigorov and L. C. Fontana

Eur. Phys. J. Appl. Phys., 49 1 (2010) 13107

DOI: https://doi.org/10.1051/epjap/2009179

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