Articles citing this article

The Citing articles tool gives a list of articles citing the current article.
The citing articles come from EDP Sciences database, as well as other publishers participating in CrossRef Cited-by Linking Program. You can set up your personal account to receive an email alert each time this article is cited by a new article (see the menu on the right-hand side of the abstract page).

Cited article:

Influence of the pressure on the interaction between stearic acid and Ar-O2 in inductively coupled radio frequency plasma

Euclides Alexandre Bernardelli, Fernanda Splett, Carlos Eduardo Farias, Rodrigo Lupinacci Villanova and Márcio Mafra
Matéria (Rio de Janeiro) 28 (3) (2023)
https://doi.org/10.1590/1517-7076-rmat-2023-0070

Investigation on Localized Etching Behaviors of Polymer Film by Atmospheric Pressure Plasma Jets

Tao Wang, Xin Wang, Jiahao Wang, et al.
Plasma Chemistry and Plasma Processing 43 (3) 679 (2023)
https://doi.org/10.1007/s11090-023-10315-0

Nature-inspired antibacterial poly (butylene succinate) (PBS) by plasma etching nanotexturing for food packaging applications

Matteo Pedroni, Espedito Vassallo, Marco Aloisio, Milena Brasca, Hao Chen, Riccardo Donnini, Giuseppe Firpo, Stefano Morandi, Silvia Maria Pietralunga, Tiziana Silvetti, Giorgio Speranza and Tersilla Virgili
Surface and Coatings Technology 471 129828 (2023)
https://doi.org/10.1016/j.surfcoat.2023.129828

Investigation on Different Etching Behaviors of Polymer Surface by Plasma Jets at Atmospheric Condition

Tao Wang, Jiahao Wang, Xin Wang, et al.
SSRN Electronic Journal (2022)
https://doi.org/10.2139/ssrn.4096047

Interplay between charging and roughness on two adjacent mask holes during plasma etching

Peng Zhang, Lidan Zhang and Kemin Lv
Physics of Plasmas 28 (1) (2021)
https://doi.org/10.1063/5.0020592

Exploring the Effects of Placement and Electron Angular Distribution on Two Adjacent Mask Holes During Plasma Etching Process

Peng Zhang, Lidan Zhang and Kemin Lv
Plasma Chemistry and Plasma Processing 40 (6) 1605 (2020)
https://doi.org/10.1007/s11090-020-10113-y

Study on the influence of electron angular distribution on mask pattern damage in plasma etching

Peng Zhang, Lidan Zhang and Lan Xu
Plasma Processes and Polymers 17 (7) (2020)
https://doi.org/10.1002/ppap.202000014

Effect of Low-Pressure Nitrogen DC Plasma Treatment on the Surface Properties of Biaxially Oriented Polypropylene, Poly (Methyl Methacrylate) and Polyvinyl Chloride Films

S. Hamideh Mortazavi, Mahmood Ghoranneviss, Soheil Pilehvar, et al.
Plasma Science and Technology 15 (4) 362 (2013)
https://doi.org/10.1088/1009-0630/15/4/10

Influence of neutral and charged species on the plasma degradation of the stearic acid

Euclides Alexandre Bernardelli, Marcio Mafra, Ana Maria Maliska, Thierry Belmonte and Aloisio Nelmo Klein
Materials Research 16 (2) 385 (2013)
https://doi.org/10.1590/S1516-14392013005000008

Increasing the Detection Limit of the Parkinson Disorder through a Specific Surface Chemistry Applied onto Inner Surface of the Titration Well

Caroline Mille, Dominique Debarnot, Willy Zorzi, Benaïssa El Moualij, Arnaud Coudreuse, Gilbert Legeay, Isabelle Quadrio, Armand Perret-Liaudet and Fabienne Poncin-Epaillard
Journal of Functional Biomaterials 3 (2) 298 (2012)
https://doi.org/10.3390/jfb3020298

Interaction Mechanisms Between Ar–O2 Post-Discharge and Stearic Acid I: Behaviour of Thin Films

E. A. Bernardelli, T. Belmonte, D. Duday, et al.
Plasma Chemistry and Plasma Processing 31 (1) 189 (2011)
https://doi.org/10.1007/s11090-010-9263-2

Significance of Hydrogen–Deuterium Exchange at Polyolefin Surfaces on Exposure to Ammonia Low-Pressure Plasma

S. Wettmarshausen, H. Min, W. Unger, et al.
Plasma Chemistry and Plasma Processing 31 (4) 551 (2011)
https://doi.org/10.1007/s11090-011-9304-5

Interaction Mechanisms Between Ar–O2 Post-Discharge and Stearic Acid II: Behaviour of Thick Films

E. A. Bernardelli, T. Belmonte, D. Duday, et al.
Plasma Chemistry and Plasma Processing 31 (1) 205 (2011)
https://doi.org/10.1007/s11090-010-9264-1

Production of N and O atoms in flowing Ar–N2–O2microwave discharges with separated N2and O2pulsed gases

E A Bernardelli, A Ricard and T Belmonte
Plasma Sources Science and Technology 20 (2) 025012 (2011)
https://doi.org/10.1088/0963-0252/20/2/025012

Comparison between hexatriacontane and stearic acid behaviours under late Ar―O2 post-discharge

T. Belmonte, E.A. Bernardelli, M. Mafra, et al.
Surface and Coatings Technology 205 S443 (2011)
https://doi.org/10.1016/j.surfcoat.2011.03.041

High Rate Etching of Polymers by Means of an Atmospheric Pressure Plasma Jet

Katja Fricke, Hartmut Steffen, Thomas von Woedtke, Karsten Schröder and Klaus‐Dieter Weltmann
Plasma Processes and Polymers 8 (1) 51 (2011)
https://doi.org/10.1002/ppap.201000093

Chemical sputtering of carbon films by simultaneous irradiation with argon ions and molecular oxygen

C Hopf, M Schlüter, T Schwarz-Selinger, U von Toussaint and W Jacob
New Journal of Physics 10 (9) 093022 (2008)
https://doi.org/10.1088/1367-2630/10/9/093022

Role of the Temperature on the Interaction Mechanisms Between Argon–Oxygen Post-Discharge and Hexatriacontane

M. Mafra, T. Belmonte, F. Poncin-Epaillard, A. S. da Silva Sobrinho and A. Maliska
Plasma Chemistry and Plasma Processing 28 (4) 495 (2008)
https://doi.org/10.1007/s11090-008-9140-4