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Cited article:
Mustapha Abdeladim, Jean-Philippe Sarrette, André Ricard, Nasredinne Mekkakia Maaza
Eur. Phys. J. Appl. Phys., 67 1 (2014) 10801
Published online: 2014-06-17
This article has been cited by the following article(s):
Densities of Active species in N2/H2 RF and HF afterglows: application to surface nitriding of TiO2 nanocrystals
André Ricard, Jean-Philippe Sarrette, Yunfei Wang, et al.
The European Physical Journal Applied Physics 80 (1) 10801 (2017)
DOI: 10.1051/epjap/2017170189
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Active species densities in R/x%N2 and R/x%(N2-5%H2) (R = Ar or He) microwave early afterglows
A. Ricard and J.P. Sarrette
Journal of Physics: Conference Series 1243 012001 (2019)
DOI: 10.1088/1742-6596/1243/1/012001
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The role of active species in the N 2 and N 2 -H 2 RF afterglows on selective surface nitriding of ALD-grown TiO 2 films
Yunfei Wang, Andre Ricard, Jean-Philippe Sarrette, Ansoon Kim and Yu Kwon Kim
Surface and Coatings Technology 324 243 (2017)
DOI: 10.1016/j.surfcoat.2017.05.085
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Erosion of a-C:H in the afterglow of ammonia plasma
Aleksander Drenik, Angelos Mourkas, Rok Zaplotnik, et al.
Journal of Nuclear Materials 475 237 (2016)
DOI: 10.1016/j.jnucmat.2016.04.011
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The role of hydrogen in the nitriding of anatase TiO2 films in the N2-H2 microwave afterglows
Seol Ryu, Yunfei Wang, Andre Ricard, et al.
Surface and Coatings Technology 364 341 (2019)
DOI: 10.1016/j.surfcoat.2019.03.011
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Controlling N and C-atom densities in N2/H2 and N2/CH4 microwave afterglows for selective TiO2 surface nitriding
Andre Ricard, Yunfei Wang, Yoon Sang Lee, et al.
Applied Surface Science 540 148348 (2021)
DOI: 10.1016/j.apsusc.2020.148348
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