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Cited article:

Titanium dioxide thin films deposition by direct current hollow cathode magnetron sputtering

D. A. Duarte, M. Massi, A. S. da Silva Sobrinho, H. S. Maciel, K. Grigorov, L. C. Fontana

Eur. Phys. J. Appl. Phys., 49 1 (2010) 13107

Published online: 2009-11-26

DOI: https://doi.org/10.1051/epjap/2009179

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Langmuir Probe Measurements in a Grid-Assisted Magnetron Sputtering System

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Deposition of SiOx thin films on Y-TZP by reactive magnetron sputtering: influence of plasma parameters on the adhesion properties between Y-TZP and resin cement for application in dental prosthesis

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Control of the substrate temperature using a triode magnetron sputtering system

D. A. Duarte, J. C. Sagás, L. C. Fontana, A. S. da Silva Sobrinho and M. J. Cinelli
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Effect of oxygen concentration and system geometry on the current–voltage relations during reactive sputter deposition of titanium dioxide thin films

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Comparison between conventional and hollow cathode magnetron sputtering systems on the growing of titanium dioxide thin films: a correlation between the gas discharge and film formation

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The European Physical Journal Applied Physics 54 (2) 20801 (2011)
DOI: 10.1051/epjap/2011100453
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Comparative study of discharge characteristics and associated film growth for post-cathode and inverted cylindrical magnetron sputtering

R Rane, A Joshi, S Akkireddy and S Mukherjee
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Amorphous carbon films in direct current magnetron sputtering from regenerative sooting discharge

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