Articles citing this article

The Citing articles tool gives a list of articles citing the current article.
The citing articles come from EDP Sciences database, as well as other publishers participating in CrossRef Cited-by Linking Program. You can set up your personal account to receive an email alert each time this article is cited by a new article (see the menu on the right-hand side of the abstract page).

Cited article:

Investigating the impact of time-dependent annealing on the characteristics of ZnO nanorods: Analysis of structural, morphological, spectroscopic, and surface properties

M. Nageswara Rao, B. Naveen Kumar Reddy, K. Prabhakara Rao and K.V. Satya Girish
Physica B: Condensed Matter 699 416831 (2025)
https://doi.org/10.1016/j.physb.2024.416831

Effect of the Oxidation of Al Substrates on Properties of TiO2 Films Deposited by Spin Coating

A. M. Ramade, R. G. Delatorre and D. A. Duarte
Brazilian Journal of Physics 54 (1) (2024)
https://doi.org/10.1007/s13538-023-01404-8

Exploration of physical properties of DC magnetron sputtered titania thin films and performance evaluation of Au/titania-based ultraviolet photodetectors

K. A. Jagadish and Dhananjaya Kekuda
Journal of Materials Science: Materials in Electronics 35 (31) (2024)
https://doi.org/10.1007/s10854-024-13752-5

Effect of femtosecond laser and sllica-coating on zirconia framework-veneering ceramic bonding, surface chemistry and crystallographic changes

Tevfik Yavuz, Muhammed Ali Aslan, Yusuf Ziya Akpinar, et al.
Journal of Adhesion Science and Technology 37 (6) 1059 (2023)
https://doi.org/10.1080/01694243.2022.2057117

First Results on Zinc Oxide Thick Film Deposition by Inverted Magnetron Sputtering for Cyclotron Solid Targets Production

Alisa Kotliarenko, Oscar Azzolini, Sara Cisternino, et al.
Materials 16 (10) 3810 (2023)
https://doi.org/10.3390/ma16103810

Comparative study of discharge characteristics and associated film growth for post-cathode and inverted cylindrical magnetron sputtering

R Rane, A Joshi, S Akkireddy and S Mukherjee
Pramana 92 (4) (2019)
https://doi.org/10.1007/s12043-018-1711-1

Langmuir Probe Measurements in a Grid-Assisted Magnetron Sputtering System

Julio César Sagás, Rodrigo Sávio Pessoa and Homero Santiago Maciel
Brazilian Journal of Physics 48 (1) 61 (2018)
https://doi.org/10.1007/s13538-017-0539-3

Effect of oxygen concentration and system geometry on the current–voltage relations during reactive sputter deposition of titanium dioxide thin films

J.C. Sagás, D.A. Duarte and S.F. Fissmer
Vacuum 85 (11) 1042 (2011)
https://doi.org/10.1016/j.vacuum.2011.03.015

Deposition of SiOx thin films on Y-TZP by reactive magnetron sputtering: influence of plasma parameters on the adhesion properties between Y-TZP and resin cement for application in dental prosthesis

José Renato Calvacanti de Queiroz, Diego Alexandre Duarte, Rodrigo Othávio de Assunção e Souza, et al.
Materials Research 14 (2) 212 (2011)
https://doi.org/10.1590/S1516-14392011005000032

Comparison between conventional and hollow cathode magnetron sputtering systems on the growing of titanium dioxide thin films: a correlation between the gas discharge and film formation

D. A. Duarte, M. Massi and A.S. da Silva Sobrinho
The European Physical Journal Applied Physics 54 (2) 20801 (2011)
https://doi.org/10.1051/epjap/2011100453

Amorphous carbon films in direct current magnetron sputtering from regenerative sooting discharge

Sumera Javeed, Sumera Yamin, Sohail Ahmad Janjua, et al.
Vacuum 86 (2) 193 (2011)
https://doi.org/10.1016/j.vacuum.2011.06.005

Control of the substrate temperature using a triode magnetron sputtering system

D. A. Duarte, J. C. Sagás, L. C. Fontana, A. S. da Silva Sobrinho and M. J. Cinelli
The European Physical Journal Applied Physics 52 (3) 31001 (2010)
https://doi.org/10.1051/epjap/2010149