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Effect of C2H4/N2 Ratio in an Atmospheric Pressure Dielectric Barrier Discharge on the Plasma Deposition of Hydrogenated Amorphous Carbon-Nitride Films (a-C:N:H)

Christian Sarra-Bournet, Nicolas Gherardi, Hervé Glénat, Gaétan Laroche and Francoise Massines
Plasma Chemistry and Plasma Processing 30 (2) 213 (2010)
DOI: 10.1007/s11090-010-9214-y
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Gas chemical studies using corona discharge reactors

P. Schulze, A. Stankiewicz, M. Aicher, M. Mattner and A. Ulrich
The European Physical Journal D 60 (3) 637 (2010)
DOI: 10.1140/epjd/e2010-00235-0
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Anti-Fog Layer Deposition onto Polymer Materials: A Multi-Step Approach

L. Maechler, C. Sarra-Bournet, P. Chevallier, N. Gherardi and G. Laroche
Plasma Chemistry and Plasma Processing 31 (1) 175 (2011)
DOI: 10.1007/s11090-010-9261-4
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Dissociation of nitrogen in a pulse-periodic dielectric barrier discharge at atmospheric pressure

N. A. Popov
Plasma Physics Reports 39 (5) 420 (2013)
DOI: 10.1134/S1063780X13050085
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