Articles citing this article

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Cited article:

Monte Carlo simulation of the influence of pressure and target–substrate distance on the sputtering process for metal and semiconductor layers

Abdelkader Bouazza and Abderrahmane Settaouti
Modern Physics Letters B 30 (20) 1650253 (2016)
https://doi.org/10.1142/S0217984916502535

The role of gas direction in a modified Grimm-type glow discharge for controlling the degree of crystallinity in brass alloy thin films

Abdallah A. Shaltout and Omar H. Abdelkader
Vacuum 121 105 (2015)
https://doi.org/10.1016/j.vacuum.2015.08.003

A new formula for sputtering yield as function of ion energies at normal incidence

Kh. I. Grais, A.A. Shaltout, S.S. Ali, et al.
Physica B: Condensed Matter 405 (7) 1775 (2010)
https://doi.org/10.1016/j.physb.2010.01.038

The design and characteristics of direct current glow discharge atomic emission source operated with plain and hollow cathodes

A. Qayyum and M.I. Mahmood
Analytica Chimica Acta 606 (1) 108 (2008)
https://doi.org/10.1016/j.aca.2007.10.050