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Cited article:

Low-temperature deposition of weakly-stressed nanocrystalline silicon films by reactive magnetron sputtering

A. Ben Othman, Y. Leconte, P. Marie, K. Zellama, C. Goncalves, X. Portier, M. Daouahi, H. Bouchriha, R. Rizk

Eur. Phys. J. Appl. Phys., 29 1 (2005) 33-38

Published online: 2004-12-21

DOI: https://doi.org/10.1051/epjap:2004207

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