Articles citing this article

The Citing articles tool gives a list of articles citing the current article.
The citing articles come from EDP Sciences database, as well as other publishers participating in CrossRef Cited-by Linking Program. You can set up your personal account to receive an email alert each time this article is cited by a new article (see the menu on the right-hand side of the abstract page).

Cited article:

Effects of La-Doped HfO 2 Films on Dielectric Properties by Sol-Gel Method

Suparat Tongpeng, Suttipong Wannapaiboon, Penphitcha Amonpattaratkit, Praphaphon Silawong, Pattanaphong Janphuang, Rungrueang Pattanakul and Sukanda Jiansirisomboon
Integrated Ferroelectrics 239 (1) 30 (2023)
https://doi.org/10.1080/10584587.2023.2234607

Local electric field perturbations due to trapping mechanisms at defects: What random telegraph noise reveals

Sara Vecchi, Paolo Pavan and Francesco Maria Puglisi
Journal of Applied Physics 133 (11) (2023)
https://doi.org/10.1063/5.0137245

Characterization of dielectric properties of residual ashes obtained from rice husk and annoni grass

Vinícius Macedo Pereira, Marcos V. Thomas Heckler, Marcos A. Z. Vasconcellos, Eliana W. de Menezes and Luis E. G. Armas
Scientific Reports 13 (1) (2023)
https://doi.org/10.1038/s41598-023-40887-y

Electrochemical Redox Cycling Behavior of Gold Nanoring Electrodes Microfabricated on a Silicon Micropillar

Haocheng Yin, Chao Tan, Shabnam Siddiqui and Prabhu U. Arumugam
Micromachines 14 (4) 726 (2023)
https://doi.org/10.3390/mi14040726

Crystallization of (Hf, Zr)O2 thin films via non-heating process and their application to ferroelectric-gate thin film transistors

Takeshi Asuka, Junpei Ouchi, Hironori Fujisawa and Seiji Nakashima
Japanese Journal of Applied Physics 62 (SM) SM1019 (2023)
https://doi.org/10.35848/1347-4065/ace916

Evolution of High Dielectric Permittivity in Low-Temperature Solution Combustion-Processed Phase-Pure High Entropy Oxide (CoMnNiFeCr)O for Thin Film Transistors

Ashritha Salian, Pavan Pujar, Robbi Vivek Vardhan, et al.
ACS Applied Electronic Materials 5 (5) 2608 (2023)
https://doi.org/10.1021/acsaelm.3c00094

Analysis of capacitance and charge accumulation for an electric double layer on porous electrode

Yoshihiro Shimazu
AIP Advances 13 (3) (2023)
https://doi.org/10.1063/5.0141215

Combining electrically detected magnetic resonance techniques to study atomic-scale defects generated by hot-carrier stressing in HfO2/SiO2/Si transistors

S. J. Moxim, J. P. Ashton, M. A. Anders and J. T. Ryan
Journal of Applied Physics 133 (14) (2023)
https://doi.org/10.1063/5.0145937

Fundamental Identification of Defect‐Related Electron Trap in Hf1−xZrxO2 Alloy Gate Dielectric on Silicon: Oxygen Vacancy versus Hydrogen Interstitial

Zhu-You Liu, Cai-Xin Zhang, Ruyue Cao, Xuefen Cai and Hui-Xiong Deng
physica status solidi (RRL) – Rapid Research Letters 17 (1) (2023)
https://doi.org/10.1002/pssr.202200316

The non-innocent role of cobalt in manipulating the magnetic and electric properties of mesoporous silica thin films

Mohamed Barakat Zakaria Hegazy, Alexei A. Belik, Takahiro Nagata, Ahmed Khalil and Toyohiro Chikyow
Microporous and Mesoporous Materials 359 112661 (2023)
https://doi.org/10.1016/j.micromeso.2023.112661

Statics and dynamics of an underwater electrostatic curved electrode actuator with rough surfaces

Melinda A Lake-Speers, Sindhu Preetham Burugupally and David J Hoelzle
Journal of Micromechanics and Microengineering 33 (12) 125003 (2023)
https://doi.org/10.1088/1361-6439/acfa0b

Modulation of GaAs nanowire growth by pre-treatment of Si substrate using a Ga focused ion beam

Nikita Shandyba, Danil Kirichenko, Vladislav Sharov, et al.
Nanotechnology 34 (46) 465603 (2023)
https://doi.org/10.1088/1361-6528/acee84

Structural, optical, and electrical properties of TiO2 thin films deposited by ALD: Impact of the substrate, the deposited thickness and the deposition temperature

Aline Jolivet, Christophe Labbé, Cédric Frilay, Olivier Debieu, Philippe Marie, Bryan Horcholle, Franck Lemarié, Xavier Portier, Clara Grygiel, Sylvain Duprey, Wojciech Jadwisienczak, David Ingram, Mudit Upadhyay, Adrian David, Arnaud Fouchet, Ulrike Lüders and Julien Cardin
Applied Surface Science 608 155214 (2023)
https://doi.org/10.1016/j.apsusc.2022.155214

Emerging nonoxide dielectrics for next‐generation electronics

Ga Hye Kim, Seung Beom Shin and Myung‐Gil Kim
Bulletin of the Korean Chemical Society 44 (10) 806 (2023)
https://doi.org/10.1002/bkcs.12764

Improvement of Resistance Change Memory Characteristics in Ferroelectric and Antiferroelectric (like) Parallel Structures

Wonwoo Kho, Hyunjoo Hwang, Jisoo Kim, Gyuil Park and Seung-Eon Ahn
Nanomaterials 13 (3) 439 (2023)
https://doi.org/10.3390/nano13030439

Electron-beam synthesis of thin magneto-dielectric coatings with mixed nickel-iron and upper alumina layers

D.B. Zolotukhin, V.A. Zhuravlev, A.V. Tyunkov, A.V. Nikonenko and Yu.G. Yushkov
Ceramics International 49 (23) 38458 (2023)
https://doi.org/10.1016/j.ceramint.2023.09.175

Demonstration of Synaptic Characteristics in VRRAM with TiN Nanocrystals for Neuromorphic System

Seyeong Yang, Taegyun Kim, Sunghun Kim, Sungjoon Kim, Tae‐Hyeon Kim, Muhammad Ismail, Chandreswar Mahata, Sungjun Kim and Seongjae Cho
Advanced Materials Interfaces 10 (21) (2023)
https://doi.org/10.1002/admi.202300290

Effect of charge transfer on band alignment in 2D|3D heterostructures: A study of HfS2|HfO2 interfaces

Ned Thaddeus Taylor and Steven Paul Hepplestone
Physical Review B 107 (20) (2023)
https://doi.org/10.1103/PhysRevB.107.205302

Recent Developments and Prospects of Fully Recessed MIS Gate Structures for GaN on Si Power Transistors

Pedro Fernandes Paes Pinto Rocha, Laura Vauche, Patricia Pimenta-Barros, et al.
Energies 16 (7) 2978 (2023)
https://doi.org/10.3390/en16072978

Lattice dynamical and thermodynamic properties study of ceria using density functional theory and Hubbard correction

Lemessa Asefa Eressa and Teshome Gerbaba Edossa
Physica B: Condensed Matter 651 414600 (2023)
https://doi.org/10.1016/j.physb.2022.414600

Recent Progress and Applications of HfO2-Based Ferroelectric Memory

Xiao Liu, Xiangshun Geng, Houfang Liu, et al.
Tsinghua Science and Technology 28 (2) 221 (2023)
https://doi.org/10.26599/TST.2021.9010096

An Ultra‐Thin, Ultra‐High Capacitance Density Tantalum Capacitor for 3D Packaging

Jiping Zhao, Youlong Xu, Wenqiang Hou, Yizhuo Li and Xiangdong Ding
Advanced Materials Technologies 8 (11) (2023)
https://doi.org/10.1002/admt.202201967

Field-Effect Mobility Extraction of Solution-Processed InGaZnO Thin-Film Transistors Considering Dielectric Dispersion Behavior of AlOx Gate Insulator

Seon-Beom Ji, Narkhyeon Seong, Jongjang Park, et al.
ACS Applied Electronic Materials 5 (2) 1035 (2023)
https://doi.org/10.1021/acsaelm.2c01541

Influence of Hf precursor concentration on various properties of sol-gel based spin coated HfO2 thin films

Sabhya, Akshayakumar Kompa, Dhananjaya Kekuda, M.S. Murari and K. Mohan Rao
Optical Materials 136 113424 (2023)
https://doi.org/10.1016/j.optmat.2022.113424

Electrolytic induced effects on hafnium oxide based electrode material

Asifa Mumtaz, Javed Iqbal, Muhammad Salman, Muhammad Oneeb and Imran Shafi
Materials Today Communications 37 107146 (2023)
https://doi.org/10.1016/j.mtcomm.2023.107146

Improved corrosion resistance of laser melting deposited CoCrFeNi-series high-entropy alloys by Al addition

Chuanlang Zhang, Liufei Huang, Shuxin Li, Kun Li, Siyuan Lu and Jinfeng Li
Corrosion Science 225 111599 (2023)
https://doi.org/10.1016/j.corsci.2023.111599

Interaction of electrolyzed nanomaterials with sandstone and carbonate rock: Experimental study and DLVO theory approach

Reza Daneshfar, Siavash Ashoori and Bahram Soltani Soulgani
Geoenergy Science and Engineering 230 212218 (2023)
https://doi.org/10.1016/j.geoen.2023.212218

Enhanced physical and electrical properties of HfO2 deposited by atomic layer deposition using a novel precursor with improved thermal stability

Seung Won Lee, Hyunchang Kim and Ji-Hoon Ahn
Surfaces and Interfaces 42 103499 (2023)
https://doi.org/10.1016/j.surfin.2023.103499

Field effect characteristics and gas sensing properties of vertically grown PANI nanofibers

Shivam Kumar Gautam and Siddhartha Panda
Organic Electronics 123 106938 (2023)
https://doi.org/10.1016/j.orgel.2023.106938

Interplay of Precursor and Plasma for The Deposition of HfO2 via PEALD: Film Growth and Dielectric Properties

Florian Preischel, David Zanders, Thomas Berning, Aleksander Kostka, Detlef Rogalla, Claudia Bock and Anjana Devi
Advanced Materials Interfaces 10 (28) (2023)
https://doi.org/10.1002/admi.202300244

Near-infrared wavelength tuning of monolayer graphene on Silicon Nitride waveguides

Artem S. Vorobev, Giuseppe Valerio Bianco, Giovanni Bruno, Antonella D’Orazio, Liam O’Faolain and Marco Grande
Photonics and Nanostructures - Fundamentals and Applications 54 101130 (2023)
https://doi.org/10.1016/j.photonics.2023.101130

Indirect Detection of Bacteria on Optically Enhanced Porous Silicon Membrane-Based Biosensors Using Selective Lytic Enzymes

Roselien Vercauteren, Audrey Leprince, Manon Nuytten, Jacques Mahillon and Laurent A. Francis
ACS Sensors 8 (7) 2627 (2023)
https://doi.org/10.1021/acssensors.3c00467

P‐155: Late‐News Poster: Low Voltage Operation a‐IGZO Thin Film Transistor Using by Thermal Oxidation Metal Oxide Insulator

Eun Seong Yu, Seung Gyun Kim, Min Seong Kim, Jong Mo Lee and Byung Seong Bae
SID Symposium Digest of Technical Papers 54 (1) 1829 (2023)
https://doi.org/10.1002/sdtp.16963

Tailoring by AgNPs of the Energetics of Charge Carriers in Electrically Insulating Polymers at the Electrode/Dielectric Contact

Kremena Makasheva, Christina Villeneuve-Faure, Adriana Scarangella, Luca Montanari, Laurent Boudou and Gilbert Teyssedre
IEEE Open Journal of Nanotechnology 4 133 (2023)
https://doi.org/10.1109/OJNANO.2023.3284201

Reactive magnetron sputtered aluminum titanate high-к dielectric films for MIM devices

Suresh Addepalli, S. V. Jagadeesh Chandra, E. V. Krishna Rao and Uthanna Suda
Applied Physics A 129 (11) (2023)
https://doi.org/10.1007/s00339-023-07065-3

Development of a Microfluidic Chip Powered by EWOD for In Vitro Manipulation of Bovine Embryos

Adriana Karcz, Ann Van Soom, Katrien Smits, et al.
Biosensors 13 (4) 419 (2023)
https://doi.org/10.3390/bios13040419

Investigation of the anatase-to-rutile transition for TiO2 sol-gel coatings with refractive index up to 2.7

Martin O'Byrne, Badre Kerzabi, Marco Abbarchi, Alejo Lifschitz, Tony Zamora, Victor Malgras, Anthony Gourdin, Mehrnaz Modaresialam, David Grosso and Magali Putero
Thin Solid Films 140193 (2023)
https://doi.org/10.1016/j.tsf.2023.140193

Heterostructure Films of SiO2 and HfO2 for High-Power Laser Optics Prepared by Plasma-Enhanced Atomic Layer Deposition

Shawon Alam, Pallabi Paul, Vivek Beladiya, et al.
Coatings 13 (2) 278 (2023)
https://doi.org/10.3390/coatings13020278

Iron oxide induced effects on the electrochemical stability and specific capacity of hafnium oxide electrode for supercapacitor applications

Asifa Mumtaz, Javed Iqbal and Muhammad Oneeb
Journal of Energy Storage 74 109320 (2023)
https://doi.org/10.1016/j.est.2023.109320

Isotropic atomic layer etchings of various materials by using dry chemical removal

Hiroto Ohtake, Nobuya Miyoshi, Kazunori Shinoda, Sumiko Fujisaki and Yoshihide Yamaguchi
Japanese Journal of Applied Physics 62 (SG) SG0801 (2023)
https://doi.org/10.35848/1347-4065/acaed0

Deposition of Thick SiO2 Coatings to Carbonyl Iron Microparticles for Thermal Stability and Microwave Performance

Arthur V. Dolmatov, Sergey S. Maklakov, Anastasia V. Artemova, et al.
Sensors 23 (3) 1727 (2023)
https://doi.org/10.3390/s23031727

Flat band voltage (VFB) drift by integrated reference electrode work function in Electrolyte Insulator Semiconductor (EIS) devices

R.R. César, M. Mederos, R.C. Teixeira and J.A. Diniz
Materials Chemistry and Physics 303 127721 (2023)
https://doi.org/10.1016/j.matchemphys.2023.127721

Analytical Subthreshold Model of Electrical Field-Effect for the Capacitance in Cylindrical Surrounding Double-Gate MOSFET Paradigm

Naveenbalaji Gowthaman and Viranjay M. Srivastava
Silicon 15 (5) 2313 (2023)
https://doi.org/10.1007/s12633-022-02181-w

Dielectric metal/metal oxide nanocomposites: modeling response properties at multiple scales

Brett Henderson, Archita N S Adluri, Jeffrey T Paci and Irina Paci
Modelling and Simulation in Materials Science and Engineering 31 (6) 065015 (2023)
https://doi.org/10.1088/1361-651X/ace540

Pattern Recognition Accuracy Optimization of Unsupervised Spiking Neural Network Using Y-Doped AlN Memristors

Yi Fu, Chu-Chun Huang, Zi-Yi Lin, Chi-Ching Lee and Jer-Chyi Wang
IEEE Transactions on Electron Devices 70 (8) 4473 (2023)
https://doi.org/10.1109/TED.2023.3283944

Modeling of Conduction Mechanisms in Ultrathin Films of Al2O3 Deposited by ALD

Silvestre Salas-Rodríguez, Joel Molina-Reyes, Jaime Martínez-Castillo, et al.
Electronics 12 (4) 903 (2023)
https://doi.org/10.3390/electronics12040903

Reliability Improvement from La2O3 Interfaces in Hf0.5Zr0.5O2‐Based Ferroelectric Capacitors

Furqan Mehmood, Ruben Alcala, Pramoda Vishnumurthy, Bohan Xu, Ridham Sachdeva, Thomas Mikolajick and Uwe Schroeder
Advanced Materials Interfaces 10 (8) (2023)
https://doi.org/10.1002/admi.202202151

Multilayer thin films of aluminum oxide and tantalum oxide deposited by pulsed direct current magnetron sputtering for dielectric applications

Richard Drevet, Pavel Souček, Pavel Mareš, Martin Dubau, Zsolt Czigány, Katalin Balázsi and Petr Vašina
Vacuum 210 111870 (2023)
https://doi.org/10.1016/j.vacuum.2023.111870

Curing Process on Passivation Layer for Backside-Illuminated CMOS Image Sensor Application

Jongseo Park, Kyeong-Keun Choi, Jehyun An, Bohyeon Kang, Hyeonseo You, Giryun Hong, Sung-Min Ahn and Rock-Hyun Baek
IEEE Access 11 60660 (2023)
https://doi.org/10.1109/ACCESS.2023.3286976

Dielectric Material Technologies for 2-D Semiconductor Transistor Scaling

Yuxuan Cosmi Lin, Cheng-Ming Lin, Hung-Yu Chen, Sam Vaziri, Xinyu Bao, Wei-Yen Woon, Han Wang and Szuya Sandy Liao
IEEE Transactions on Electron Devices 70 (4) 1454 (2023)
https://doi.org/10.1109/TED.2022.3224100

Post-deposition annealing challenges for ALD Al0.5Si0.5Ox/n-GaN MOS devices

P. Fernandes Paes Pinto Rocha, L. Vauche, M. Bedjaoui, S. Cadot, B. Mohamad, W. Vandendaele, E. Martinez, N. Gauthier, F. Pierre, H. Grampeix, G. Lefèvre, B. Salem and V. Sousa
Solid-State Electronics 209 108780 (2023)
https://doi.org/10.1016/j.sse.2023.108780

Low Leakage in High‐k Perovskite Gate Oxide SrHfO3

Juhan Kim, Dowon Song, Hwanhui Yun, Jaehyeok Lee, Jae Ha Kim, Jae Hoon Kim, Bongju Kim and Kookrin Char
Advanced Electronic Materials 9 (6) (2023)
https://doi.org/10.1002/aelm.202201341

Reducing the oxygen vacancy concentration in SrTiO3-δ thin films via an optimized O2 plasma treatment for enhancing device properties

Ji-Yeop Kim, Mi-Jin Jin, Bo Hou, Minsoo P. Kim, Doo-Seung Um and Chang-Il Kim
Applied Surface Science 639 158271 (2023)
https://doi.org/10.1016/j.apsusc.2023.158271

Challenges for Nanoscale CMOS Logic Based on Two-Dimensional Materials

Theresia Knobloch, Siegfried Selberherr and Tibor Grasser
Nanomaterials 12 (20) 3548 (2022)
https://doi.org/10.3390/nano12203548

Analyzing the Impact of Different Composite Dielectrics on Performance Parameters of a Magnetic Tunnel Junction Memory Device

Reshma Sinha and Jasdeep Kaur
Journal of Electronic Materials 51 (10) 5686 (2022)
https://doi.org/10.1007/s11664-022-09841-y

d-Orbital-Driven Low Lattice Thermal Conductivity in TiRhBi: A Root for Potential Thermoelectric and Microelectronic Performance

Sonu Prasad Keshri and Swapan K. Pati
ACS Applied Energy Materials 5 (11) 13590 (2022)
https://doi.org/10.1021/acsaem.2c02304

Channel Engineering Assisted Performance Enhancement of Metal Gate Sub-10nm Ballistic SiNWFET for Futuristic Device Applications

Bhoop Singh, Karamvir Singh, Sandeep Sharma, et al.
Silicon 14 (12) 6861 (2022)
https://doi.org/10.1007/s12633-021-01459-9

Using Jupyter Tools to Design an Interactive Textbook to Guide Undergraduate Research in Materials Informatics

Enze Chen and Mark Asta
Journal of Chemical Education 99 (10) 3601 (2022)
https://doi.org/10.1021/acs.jchemed.2c00640

Growth and characterization of Ti-based films obtained from two selected precursors: H2O, TiCl4, Ti(N(CH3)2)4 or Al2(CH3)6 by the ALD method

Lukasz Wachnicki, Sylwia Gieraltowska, Bartlomiej S. Witkowski, Marek Godlewski and Elzbieta Guziewicz
Materials Science in Semiconductor Processing 148 106792 (2022)
https://doi.org/10.1016/j.mssp.2022.106792

Computational exploration and screening of novel Janus MA2Z4 (M = Sc-Zn, Y-Ag, Hf-Au; A=Si, Ge; Z=N, P) monolayers and potential application as a photocatalyst

Weibin Zhang, Woochul Yang, Yingkai Liu, Zhiyong Liu and Fuchun Zhang
Frontiers of Physics 17 (6) (2022)
https://doi.org/10.1007/s11467-022-1199-5

Photovoltaic/photo-electrocatalysis integration for green hydrogen: A review

Piyali Chatterjee, Mounika Sai Krishna Ambati, Amit K. Chakraborty, et al.
Energy Conversion and Management 261 115648 (2022)
https://doi.org/10.1016/j.enconman.2022.115648

Strong temperature dependence of transfer characteristics and time constants near freezing point of ionic liquid in an ambipolar electric double layer transistor

Yoshihiro Shimazu and Shotaro Ono
Physics Letters A 452 128444 (2022)
https://doi.org/10.1016/j.physleta.2022.128444

Interfacial engineering of ZrO2 metal-insulator-metal capacitor using Al2O3/TiO2 buffer layer for improved leakage properties

Heecheol Shin, Hyobin Choi, Jaeseong Lim, et al.
Journal of Asian Ceramic Societies 10 (3) 649 (2022)
https://doi.org/10.1080/21870764.2022.2101216

Impact on performance of dual stack hetero- gated dielectric modulated TFET biosensor due to Si1-xGex pocket variation

Ayush Mangla, Rajesh Saha and Rupam Goswami
Microelectronics Journal 129 105603 (2022)
https://doi.org/10.1016/j.mejo.2022.105603

Advances in VLSI, Communication, and Signal Processing

Avijit Deb Sarkar
Lecture Notes in Electrical Engineering, Advances in VLSI, Communication, and Signal Processing 911 719 (2022)
https://doi.org/10.1007/978-981-19-2631-0_62

A critical review on performance, reliability, and fabrication challenges in nanosheet FET for future analog/digital IC applications

Sresta Valasa, Shubham Tayal, Laxman Raju Thoutam, J. Ajayan and Sandip Bhattacharya
Micro and Nanostructures 170 207374 (2022)
https://doi.org/10.1016/j.micrna.2022.207374

Chemical defect-dependent resistive switching characterization in CeO2 thin films

Tran Thi Be Lan, Yu-Teng Li, An-Cheng Aidan Sun, Hsi-Chuan Lu and Sea-Fue Wang
Materials Science in Semiconductor Processing 137 106177 (2022)
https://doi.org/10.1016/j.mssp.2021.106177

Bidirectional Selector Realized Through Multilayer Tunnel Barrier Engineering

Dequan Dong, Huikai He, Jian Xia, Rui Yang and Xiangshui Miao
IEEE Journal of the Electron Devices Society 10 367 (2022)
https://doi.org/10.1109/JEDS.2022.3167769

Temperature-dependent luminescence of intrinsic defects and excitons in nanocrystalline monoclinic Y2O3 films

Yu A. Kuznetsova, D.A. Zatsepin, A.F. Zatsepin and N.V. Gavrilov
Journal of Luminescence 250 119102 (2022)
https://doi.org/10.1016/j.jlumin.2022.119102

Ultra-efficient DC-gated all-optical graphene switch

Mohammed Alaloul, Khalil As’ham, Haroldo T Hattori and Andrey E Miroshnichenko
Journal of Optics 24 (10) 105801 (2022)
https://doi.org/10.1088/2040-8986/ac8a5c

Sergey Zyuzin, Yason Zasseev, Askar Rezvanov, Vitaliy V. Panin, Vladimir Gvozdev, Yevgeniy Gornev, Konstantin V. Rudenko and Vladimir F. Lukichev
75 (2022)
https://doi.org/10.1117/12.2624575

Grain boundary passivation via balancing feedback of hole barrier modulation in HfO2-x for nanoscale flexible electronics

Yeon Soo Kim, Harry Chung, Suhyoun Kwon, Jihyun Kim and William Jo
Nano Convergence 9 (1) (2022)
https://doi.org/10.1186/s40580-022-00336-4

Nanoscale Strategies to Enhance the Energy Storage Capacity of Polymeric Dielectric Capacitors: Review of Recent Advances

Maninderjeet Singh, Ikeoluwa E. Apata, Saumil Samant, et al.
Polymer Reviews 62 (2) 211 (2022)
https://doi.org/10.1080/15583724.2021.1917609

Structural, electronic and electrical conduction behaviour of Gd3+ doped Ca2−xY2O5 metal oxide ceramic synthesised by solid state reaction method

Sadhana Agrawal
Journal of the Australian Ceramic Society 58 (2) 683 (2022)
https://doi.org/10.1007/s41779-022-00720-7

HfO2-based ferroelectrics: From enhancing performance, material design, to applications

Haiyan Chen, Xuefan Zhou, Lin Tang, Yonghong Chen, Hang Luo, Xi Yuan, Chris R. Bowen and Dou Zhang
Applied Physics Reviews 9 (1) (2022)
https://doi.org/10.1063/5.0066607

Microwave Flexible Electronics Directly Transformed from Foundry‐Produced, Multilayered Monolithic Integrated Circuits

Guoxuan Qin, Yei Hwan Jung, Huilong Zhang, Ningyue Jiang, Pingxi Ma, Scott Stetson, Marco Racanelli and Zhenqiang Ma
Advanced Electronic Materials 8 (7) (2022)
https://doi.org/10.1002/aelm.202101350

Ferroelectric-Antiferroelectric Transition of Hf1–xZrxO2 on Indium Arsenide with Enhanced Ferroelectric Characteristics for Hf0.2Zr0.8O2

Hannes Dahlberg, Anton E. O. Persson, Robin Athle and Lars-Erik Wernersson
ACS Applied Electronic Materials 4 (12) 6357 (2022)
https://doi.org/10.1021/acsaelm.2c01483

Impact of annealing on electric and elastic properties of 10-nm Hf0.5Zr0.5O2 films prepared on Si by sputtering

Leonid Bolotov, Shinji Migita, Ryouta Fujio, et al.
Microelectronic Engineering 258 111770 (2022)
https://doi.org/10.1016/j.mee.2022.111770

Passive film formation on the new biocompatible non-equiatomicTi21Nb24Mo23Hf17Ta15 high entropy alloy before and after resting in simulated body fluid

Virginie Roche, Yannick Champion, Ivan A. Bataev and Alberto Moreira Jorge Junior
Corrosion Science 207 110607 (2022)
https://doi.org/10.1016/j.corsci.2022.110607

Acoustic wave amplification with thin film silicon bonded on lithium niobate

Siddhartha Ghosh
Journal of Micromechanics and Microengineering 32 (11) 114001 (2022)
https://doi.org/10.1088/1361-6439/ac9289

A Tour‐Guide through Carbon Nitride‐Land: Structure‐ and Dimensionality‐Dependent Properties for Photo(Electro)Chemical Energy Conversion and Storage

Vincent Wing‐hei Lau and Bettina V. Lotsch
Advanced Energy Materials 12 (4) (2022)
https://doi.org/10.1002/aenm.202101078

Nonaqueous Chemistry of Group 4 Oxo Clusters and Colloidal Metal Oxide Nanocrystals

Dietger Van den Eynden, Rohan Pokratath and Jonathan De Roo
Chemical Reviews 122 (11) 10538 (2022)
https://doi.org/10.1021/acs.chemrev.1c01008