Articles citing this article

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Cited article:

Low temperature drive-in of surface-deposited copper in silicon wafers

M. L. Polignano, D. Caputo, C. Carpanese, G. Salvà, L. Vanzetti

Eur. Phys. J. Appl. Phys., 27 1-3 (2004) 435-438

Published online: 2004-07-15

DOI: https://doi.org/10.1051/epjap:2004138

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https://doi.org/10.1149/2.0111911jss

Metal Impurities in Silicon- and Germanium-Based Technologies

Cor Claeys and Eddy Simoen
Springer Series in Materials Science, Metal Impurities in Silicon- and Germanium-Based Technologies 270 125 (2018)
https://doi.org/10.1007/978-3-319-93925-4_5

Test Methods for Measuring Bulk Copper and Nickel in Heavily Doped p-Type Silicon Wafers

Laszlo Fabry, Robert Hoelzl, Andre Andrukhiv, et al.
Journal of The Electrochemical Society 153 (6) G566 (2006)
https://doi.org/10.1149/1.2186799