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Cited article:

Investigation of stress-induced (100) platelet formation and surface exfoliation in plasma hydrogenated Si

Zengfeng Di, Yongqiang Wang, Michael Nastasi, Francois Rossi, Jung-Kun Lee, Lin Shao and Phillip E. Thompson
Applied Physics Letters 91 (24) (2007)
https://doi.org/10.1063/1.2822414

The Impact of Hydrogen Plasma Treatments at Moderate Temperatures on Sintered Zinc Oxide Samples - Evidence for Hydrogen Induced Nano-Void Formation

Reinhart Job
MRS Proceedings 957 (2006)
https://doi.org/10.1557/PROC-0957-K10-40

Blistering of implanted crystalline silicon by plasma hydrogenation investigated by Raman scattering spectroscopy

W. Düngen, R. Job, T. Mueller, Y. Ma, W. R. Fahrner, L. O. Keller, J. T. Horstmann and H. Fiedler
Journal of Applied Physics 100 (12) (2006)
https://doi.org/10.1063/1.2401030

Void Formation in Hydrogen Implanted and Subsequently Plasma Hydrogenated and Annealed Czochralski Silicon

R. Job, W. Düngen, Y. Ma, Y. L. Huang and J. T. Horstmann
MRS Proceedings 864 (2005)
https://doi.org/10.1557/PROC-864-E10.2

μ-Raman Spectra Analysis of the Evolution of Hydrogen Related Defects and Void Formation in the Silicon Ion-Cut Process

W. Düngen, R. Job, Y. Ma, et al.
MRS Proceedings 864 (2005)
https://doi.org/10.1557/PROC-864-E9.25

Trapping of hydrogen in argon-implanted crystalline silicon

Y. Ma, R. Job, W. Düngen, Y. L. Huang, W. R. Fahrner, M. F. Beaufort, S. Rousselet and J. T. Horstmann
Applied Physics Letters 86 (25) (2005)
https://doi.org/10.1063/1.1953871

Suppression of hydrogen diffusion at the hydrogen-induced platelets in p-type Czochralski silicon

Y. L. Huang, Y. Ma, R. Job and W. R. Fahrner
Applied Physics Letters 86 (13) (2005)
https://doi.org/10.1063/1.1896443

Hydride formation on the platelet inner surface of plasma-hydrogenated crystalline silicon investigated with Raman spectroscopy

Y. Ma, Y. L. Huang, W. Düngen, R. Job and W. R. Fahrner
Physical Review B 72 (8) (2005)
https://doi.org/10.1103/PhysRevB.72.085321

Hydrogen diffusion at moderate temperatures in p-type Czochralski silicon

Y. L. Huang, Y. Ma, R. Job and A. G. Ulyashin
Journal of Applied Physics 96 (12) 7080 (2004)
https://doi.org/10.1063/1.1812379

On the Formation Kinetics of Thin Nanopatterned Layers on Silicon Wafers Created by Hydrogen Plasma Exposure

R. Job, Y. L. Huang, Y. Ma, B. Zölgert and W. Düngen
MRS Proceedings 849 (2004)
https://doi.org/10.1557/PROC-849-KK7.2

Three-Layer Structure of Hydrogenated Czochralski Silicon

Y. Ma, R. Job, Y. L. Huang, et al.
Journal of The Electrochemical Society 151 (9) G627 (2004)
https://doi.org/10.1149/1.1781613

Structuring of Silicon Wafer Surfaces on the Sub-100 nm Scale by Hydrogen Plasma Treatments

R. Job, Y. Ma and A. G. Ulyashin
MRS Proceedings 788 (2003)
https://doi.org/10.1557/PROC-788-L3.34